text: 9 April 2015 Sub-10-nm patterning process using directed self-assembly with high χ block copolymers
  Naoko Kihara, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Teruaki Hayakawa, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Hideki Kanai, Yoshiaki Kawamonzen, Katsuyoshi Kodera, Tsukasa Azuma
  Naoko Kihara, Naoko Kihara, Yuriko Seino, Yuriko Seino, Hironobu Sato, Hironobu Sato, Yusuke Kasahara, Yusuke Kasahara, Katsutoshi Kobayashi, Katsutoshi Kobayashi, Ken Miyagi, Ken Miyagi, Shinya Minegishi, Shinya Minegishi, Teruaki Hayakawa, Teruaki Hayakawa, Koichi Yatsuda, Koichi Yatsuda, Tomoharu Fujiwara, Tomoharu Fujiwara, Noriyuki Hirayanagi, Noriyuki Hirayanagi, Hideki Kanai, Hideki Kanai, Yoshiaki Kawamonzen, Yoshiaki Kawamonzen, Katsuyoshi Kodera, Katsuyoshi Kodera, Tsukasa Azuma, Tsukasa Azuma, "Sub-10-nm patterning process using directed self-assembly with high χ block copolymers," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(2), 023502 (9 April 2015). https://doi.org/10.1117/1.JMM.14.2.023502 . Submission:
  Naoko Kihara, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Teruaki Hayakawa, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Hideki Kanai, Yoshiaki Kawamonzen, Katsuyoshi Kodera, Tsukasa Azuma, "Sub-10-nm patterning process using directed self-assembly with high χ block copolymers," J. Micro/Nanolith. MEMS MOEMS 14(2) 023502 (9 April 2015)